- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/3065 - Plasma etching; Reactive-ion etching
Patent holdings for IPC class H01L 21/3065
Total number of patents in this class: 7878
10-year publication summary
563
|
616
|
742
|
751
|
759
|
795
|
583
|
539
|
509
|
201
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Tokyo Electron Limited | 11599 |
1414 |
Applied Materials, Inc. | 16587 |
803 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
607 |
Lam Research Corporation | 4775 |
551 |
International Business Machines Corporation | 60644 |
194 |
Hitachi High-Tech Corporation | 4424 |
183 |
Samsung Electronics Co., Ltd. | 131630 |
127 |
ULVAC, Inc. | 1448 |
85 |
Tokyo Electron U.S. Holdings, Inc | 608 |
75 |
Panasonic Intellectual Property Management Co., Ltd. | 27812 |
67 |
Semiconductor Components Industries, L.L.C. | 5345 |
67 |
GLOBALFOUNDRIES U.S. Inc. | 6459 |
64 |
Semiconductor Manufacturing International (Shanghai) Corporation | 1764 |
63 |
ASM IP Holding B.V. | 1715 |
57 |
Disco Corporation | 1745 |
57 |
Kioxia Corporation | 9847 |
57 |
Sumitomo Electric Industries, Ltd. | 14131 |
55 |
Kyocera Corporation | 12735 |
52 |
Varian Semiconductor Equipment Associates, Inc. | 1282 |
45 |
Canon Anelva Corporation | 676 |
45 |
Other owners | 3210 |